Issued Patents 2003
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6645061 | Polishing pad having a grooved pattern for use in chemical mechanical polishing | Doyle E. Bennett, Fred C. Redeker, Ginetto Addiego | 2003-11-11 |
| 6616513 | Grid relief in CMP polishing pad to accurately measure pad wear, pad profile and pad wear profile | — | 2003-09-09 |
| 6572446 | Chemical mechanical polishing pad conditioning element with discrete points and compliant membrane | Manoocher Birang, Robert D. Tolles, Steven M. Zuniga, Charles C. Garretson | 2003-06-03 |
| 6561381 | Closed loop control over delivery of liquid material to semiconductor processing tool | Benjamin A. Bonner, Michael W. Richter | 2003-05-13 |
| 6520847 | Polishing pad having a grooved pattern for use in chemical mechanical polishing | Sen-Hou Ko | 2003-02-18 |