RW

Ralf B. Willecke

Applied Materials: 6 patents #36 of 884Top 5%
🗺 California: #634 of 28,521 inventorsTop 3%
Overall (2003): #5,449 of 273,478Top 2%
6
Patents 2003

Issued Patents 2003

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
6660656 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-12-09
6632735 Method of depositing low dielectric constant carbon doped silicon oxide Wai-Fan Yau, Ju-Hyung Lee, Nasreen Chopra, Tzu-Fang Huang, David Cheung +5 more 2003-10-14
6596655 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-07-22
6593247 Method of depositing low k films using an oxidizing plasma Tzu-Fang Huang, Yung-Cheng Lu, Li-Qun Xia, Ellie Yieh, Wai-Fan Yau +5 more 2003-07-15
6562690 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-05-13
6541282 Plasma processes for depositing low dielectric constant films David Cheung, Wai-Fan Yau, Robert P. Mandal, Shin-Puu Jeng, Kuo-Wei Liu +5 more 2003-04-01