Issued Patents 2002
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6475906 | Gate contact etch sequence and plasma doping method for sub-150 NM DT-based DRAM devices | — | 2002-11-05 |
| 6475859 | Plasma doping for DRAM with deep trenches and hemispherical grains | Helmut Tews, Joachim Hoepfner | 2002-11-05 |
| 6472302 | Integration method for raised contact formation for sub-150 nm devices | — | 2002-10-29 |
| 6426253 | Method of forming a vertically oriented device in an integrated circuit | Helmut Tews, Alexander Michaelis, Uwe Schroeder, Stephan Kudelka | 2002-07-30 |
| 6372567 | Control of oxide thickness in vertical transistor structures | Helmut Tews, Ulrike Gruening | 2002-04-16 |
| 6362040 | Reduction of orientation dependent oxidation for vertical sidewalls of semiconductor substrates | Helmut Tews, Ulrike Gruening, Raj Jammy, John Faltermeier | 2002-03-26 |
| 6348388 | Process for fabricating a uniform gate oxide of a vertical transistor | Johnathan E. Faltermeier, Ulrike Gruening, Suryanarayan G. Hegde, Rajarao Jammy, Helmut Tews | 2002-02-19 |
| 6335247 | Integrated circuit vertical trench device and method of forming thereof | Helmut Tews, Alexander Michaelis, Stephan Kudelka, Uwe Schroeder | 2002-01-01 |