Issued Patents 2002
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500321 | Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target | Kaihan Ashtiani, Larry D. Hartsough, Richard S. Hill, Robert Martinson | 2002-12-31 |
| 6497734 | Apparatus and method for enhanced degassing of semiconductor wafers for increased throughput | Kenneth K. Barber, Mark Fissel, Soo Yun Joh, Mukul Khosla, Robert Martinson +2 more | 2002-12-24 |
| 6497796 | Apparatus and method for controlling plasma uniformity across a substrate | Kaihan Ashtiani, Kwok Fai Lai, Andrew L. Nordquist, Larry D. Hartsough | 2002-12-24 |
| 6444105 | Physical vapor deposition reactor including magnet to control flow of ions | Kwok Fai Lai, Andrew L. Nordquist, Kaihan Ashtiani, Larry D. Hartsough | 2002-09-03 |