Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6500321 | Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target | Kaihan Ashtiani, Richard S. Hill, Karl B. Levy, Robert Martinson | 2002-12-31 |
| 6497796 | Apparatus and method for controlling plasma uniformity across a substrate | Kaihan Ashtiani, Karl B. Levy, Kwok Fai Lai, Andrew L. Nordquist | 2002-12-24 |
| 6444105 | Physical vapor deposition reactor including magnet to control flow of ions | Kwok Fai Lai, Andrew L. Nordquist, Kaihan Ashtiani, Karl B. Levy | 2002-09-03 |