Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6461529 | Anisotropic nitride etch process with high selectivity to oxide and photoresist layers in a damascene etch scheme | Diane C. Boyd, Stuart M. Burns, Hussein I. Hanafi, Waldemar Walter Kocon, Richard S. Wise | 2002-10-08 |
| 6361402 | Method for planarizing photoresist | Donald F. Canaperi, Rangarajan Jagannathan, Mahadevaiyer Krishnan, Max G. Levy, Uma Satyendra +2 more | 2002-03-26 |