Issued Patents All Time
Showing 26–50 of 80 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7819082 | Plasma processing apparatus | Tadahiro Ohmi | 2010-10-26 |
| 7723637 | Plasma processing apparatus | Tadahiro Ohmi, Takahiro Horiguchi | 2010-05-25 |
| 7718484 | Method of forming a dielectic film that contains silicon, oxygen and nitrogen and method of fabricating a semiconductor device that uses such a dielectric film | Tadahiro Ohmi, Shigetoshi Sugawa, Yasuyuki Shirai | 2010-05-18 |
| 7670454 | Plasma processing apparatus | Tadahiro Ohmi, Shigetoshi Sugawa, Tetsuya Goto | 2010-03-02 |
| 7538012 | Fluorine-containing carbon film forming method | Tadahiro Ohmi | 2009-05-26 |
| 7520245 | Plasma processing apparatus | Tadahiro Ohmi | 2009-04-21 |
| 7478609 | Plasma process apparatus and its processor | Naoko Yamamoto, I'atsushi Yamamoto, I'adahiro Ohmi | 2009-01-20 |
| 7439121 | Dielectric film and method of forming it, semiconductor device, non-volatile semiconductor memory device, and production method for semiconductor device | Tadahiro Ohmi, Shigetoshi Sugawa, Yasuyuki Shirai | 2008-10-21 |
| 7432468 | Plasma processing apparatus and plasma processing method | Shinsuke Oka, Takahiro Horiguchi, Kazuaki Nishimura, Masayuki Kitamura, Tadahiro Ohmi | 2008-10-07 |
| 7404991 | Device and control method for micro wave plasma processing | Tadahiro Ohmi, Shigetoshi Sugawa, Tetsuya Goto | 2008-07-29 |
| 7374620 | Substrate processing apparatus | Tadahiro Ohmi | 2008-05-20 |
| 7329609 | Substrate processing method and substrate processing apparatus | Tadahiro Ohmi, Shigetoshi Sugawa | 2008-02-12 |
| 7325511 | Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus | Naohisa Goto, Tadahiro Ohmi, Tetsuya Goto | 2008-02-05 |
| 7312415 | Plasma method with high input power | Tadahiro Ohmi, Takahisa Nitta, Haruyuki Takano, Ryu Kaiwara | 2007-12-25 |
| 7141756 | Microwave plasma processing apparatus, plasma ignition method, plasma forming method, and plasma processing method | Tadahiro Ohmi, Shigetoshi Sugawa, Tetsuya Goto | 2006-11-28 |
| 7115184 | Plasma processing device | Tadahiro Ohmi, Shigetoshi Sugawa, Tetsuya Goto | 2006-10-03 |
| 7097735 | Plasma processing device | Tadahiro Ohmi, Shigetoshi Sugawa, Tetsuya Goto | 2006-08-29 |
| 7083701 | Device and method for plasma processing, and slow-wave plate | Tadahiro Ohmi, Shigetoshi Sugawa, Tetsuya Goto | 2006-08-01 |
| 7000419 | High-efficiency gas temperature/humidity controlling device and controlling method | Tadahiro Ohmi, Yasuyuki Shirai, Hideo Hanaoka, Takeshi Honma, Hirokazu Suzuki +2 more | 2006-02-21 |
| 6975018 | Semiconductor device | Tadahiro Ohmi, Shigetoshi Sugawa, Yasuyukil Shirai | 2005-12-13 |
| 6929830 | Plasma treatment method and method of manufacturing optical parts using the same | Goushu Tei, Nobuyoshi Tanaka, Tadahiro Ohmi | 2005-08-16 |
| 6896490 | Vacuum apparatus | Tadahiro Ohmi | 2005-05-24 |
| 6893970 | Plasma processing method | Norio Kanetsuki, Tatsushi Yamamoto, Tadahiro Ohmi | 2005-05-17 |
| 6866747 | Plasma processing apparatus | Takamitsu Tadera, Tatsushi Yamamoto, Tadahiro Ohmi | 2005-03-15 |
| 6847672 | Laser gas supply path structure in an exposure apparatus | Tadahiro Ohmi, Hiroshi Osawa, Nobuyoshi Tanaka, Kazuhide Ino, Toshikuni Shinohara +1 more | 2005-01-25 |