KO

Kenta ONO

TL Tokyo Electron Limited: 4 patents #1,723 of 5,567Top 35%
MC Max Co.: 1 patents #201 of 321Top 65%
SE Seiko Epson: 1 patents #5,551 of 7,774Top 75%
Tdk: 1 patents #2,493 of 3,796Top 70%
📍 Rifu, JP: #402 of 2,101 inventorsTop 20%
Overall (All Time): #607,118 of 4,157,543Top 15%
8
Patents All Time

Issued Patents All Time

Showing 1–8 of 8 patents

Patent #TitleCo-InventorsDate
12412750 Plasma processing method and plasma processing apparatus Shinya Ishikawa, Masanobu Honda 2025-09-09
12112954 Etching method, substrate processing apparatus, and substrate processing system Maju TOMURA, Tomohiko NIIZEKI, Takayuki Katsunuma, Hironari Sasagawa, Yuta NAKANE +4 more 2024-10-08
11865850 Liquid ejecting apparatus and liquid ejecting head Shingo Tomimatsu, Masahiko Sato, Hiroki Kobayashi, Osamu Yagi 2024-01-09
11651971 Etching method, substrate processing apparatus, and substrate processing system Shinya Ishikawa, Masanobu Honda 2023-05-16
11355350 Etching method, substrate processing apparatus, and substrate processing system Shinya Ishikawa, Maju TOMURA, Masanobu Honda 2022-06-07
11328933 Etching method, substrate processing apparatus, and substrate processing system Shinya Ishikawa, Masanobu Honda 2022-05-10
8697546 Method of manufacturing semiconductor device 2014-04-15
8582277 Laminated type ceramic electronic parts Hirobumi Tanaka, Makoto Endo, Satoko Ueda, Daisuke Ueda, Shogo Murosawa +3 more 2013-11-12