Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11710644 | Etching method and plasma processing apparatus | Takahiro Yokoyama, Taihei MATSUHASHI, Masanori Hosoya | 2023-07-25 |
| 9818610 | Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP) | Andrew Metz, Yannick Feurprier, Katie Lutker-Lee | 2017-11-14 |
| 9607834 | Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP) | Andrew Metz, Yannick Feurprier, Katie Lutker-Lee | 2017-03-28 |
| 9099285 | Plasma processing method and plasma processing apparatus | Kazuto Ogawa | 2015-08-04 |