Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6544875 | Chemical vapor deposition of silicate high dielectric constant materials | — | 2003-04-08 |
| 6534348 | Ultrascaled MIS transistors fabricated using silicon-on-lattice-matched insulator approach | Theodore S. Moise | 2003-03-18 |
| 6498502 | Apparatus and method for evaluating semiconductor structures and devices | Henry Litzmann Edwards, Theodore S. Moise | 2002-12-24 |
| 6495474 | Method of fabricating a dielectric layer | Conor S. Rafferty | 2002-12-17 |
| 6479404 | Process for fabricating a semiconductor device having a metal oxide or a metal silicate gate dielectric layer | Michael L. Steigerwald | 2002-11-12 |
| 6468856 | High charge storage density integrated circuit capacitor | Robert M. Wallace, Mark Anthony, Dim-Lee Kwong | 2002-10-22 |
| 6436801 | Hafnium nitride gate dielectric | Robert M. Wallace | 2002-08-20 |
| 6420729 | Process to produce ultrathin crystalline silicon nitride on Si (111) for advanced gate dielectrics | Robert M. Wallace, Yi Wei, Sunil Hattangady | 2002-07-16 |
| 6291282 | Method of forming dual metal gate structures or CMOS devices | Scott R. Summerfelt | 2001-09-18 |
| 6291283 | Method to form silicates as high dielectric constant materials | — | 2001-09-18 |
| 6291866 | Zirconium and/or hafnium oxynitride gate dielectric | Robert M. Wallace, Richard Stoltz | 2001-09-18 |
| 6291867 | Zirconium and/or hafnium silicon-oxynitride gate dielectric | Robert M. Wallace, Richard Stoltz | 2001-09-18 |
| 6277681 | Process to produce ultrathin crystalline silicon nitride on Si(111) for advanced gate dielectrics | Robert M. Wallace, Yi Wei, Sunil Hattangady | 2001-08-21 |
| 6274510 | Lower temperature method for forming high quality silicon-nitrogen dielectrics | John Mark Anthony, Yi Wei, Robert M. Wallace | 2001-08-14 |
| 6258637 | Method for thin film deposition on single-crystal semiconductor substrates | Yi Wei, Robert M. Wallace | 2001-07-10 |
| 6255150 | Use of crystalline SiOx barriers for Si-based resonant tunneling diodes | Berinder Brar | 2001-07-03 |
| 6248621 | Method of growing high-quality crystalline silicon quantum wells for RTD structures | John Mark Anthony | 2001-06-19 |
| 6245606 | Low temperature method for forming a thin, uniform layer of aluminum oxide | Robert M. Wallace | 2001-06-12 |
| 6150242 | Method of growing crystalline silicon overlayers on thin amorphous silicon oxide layers and forming by method a resonant tunneling diode | Jan Paul Anthonie van der Wagt, Robert M. Wallace | 2000-11-21 |
| 6069368 | Method for growing high-quality crystalline Si quantum wells for RTD structures | John Mark Anthony | 2000-05-30 |
| 6040230 | Method of forming a nano-rugged silicon-containing layer | John Mark Anthony, Robert M. Wallace, Yi Wei | 2000-03-21 |
| 6020243 | Zirconium and/or hafnium silicon-oxynitride gate dielectric | Robert M. Wallace, Richard Stoltz | 2000-02-01 |
| 6020247 | Method for thin film deposition on single-crystal semiconductor substrates | Yi Wei, Robert M. Wallace | 2000-02-01 |
| 6013553 | Zirconium and/or hafnium oxynitride gate dielectric | Robert M. Wallace, Richard Stoltz | 2000-01-11 |