Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12388027 | Semiconductor wafer scribelane structure | Jeffrey Alan West | 2025-08-12 |
| 12355025 | Standalone isolation capacitor | Thomas D. Bonifield, Jeffrey Alan West, Byron Lovell Williams | 2025-07-08 |
| 12230669 | Standalone high voltage galvanic isolation capacitors | Thomas D. Bonifield, Jeffrey Alan West, Byron Lovell Williams | 2025-02-18 |
| 11901402 | Standalone isolation capacitor | Thomas D. Bonifield, Jeffrey Alan West, Byron Lovell Williams | 2024-02-13 |
| 11798979 | Integrated capacitor with sidewall having reduced roughness | Jeffrey Alan West, Thomas D. Bonifield, Joseph A. Gallegos, Jay Sung Chun, Zhiyi Yu | 2023-10-24 |
| 11784212 | Standalone high voltage galvanic isolation capacitors | Thomas D. Bonifield, Jeffrey Alan West, Byron Lovell Williams | 2023-10-10 |
| 11532693 | Passive components with improved characteristics | Jeffrey Alan West, Byron Lovell Williams, Thomas Dyer Bonifeld | 2022-12-20 |
| 11495658 | Hybrid high and low stress oxide embedded capacitor dielectric | Jeffrey Alan West, Thomas D. Bonifield | 2022-11-08 |
| 11205695 | Method of fabricating a thick oxide feature on a semiconductor wafer | Jeffrey Alan West, Thomas D. Bonifield, Jay Sung Chun, Byron Lovell Williams | 2021-12-21 |
| 11121224 | Transistor with field plate over tapered trench isolation | Ming-Yeh Chuang | 2021-09-14 |
| 11087451 | Generating multi-focal defect maps using optical tools | Young Sawk Oh, Zhiyi Yu, Jeffrey Alan West, Thomas D. Bonifield | 2021-08-10 |
| 11049820 | Crack suppression structure for HV isolation component | Jeffrey Alan West | 2021-06-29 |
| 10978548 | Integrated capacitor with sidewall having reduced roughness | Jeffrey Alan West, Thomas D. Bonifield, Joseph A. Gallegos, Jay Sung Chun, Zhiyi Yu | 2021-04-13 |
| 10886120 | Hydrogen ventilation of CMOS wafers | Jeffrey Alan West, Adrian Salinas, Dhanoop Varghese, Thomas D. Bonifield | 2021-01-05 |
| 9716013 | Sloped photoresist edges for defect reduction for metal dry etch processes | Neng Jiang, Yung Shan Chang, Ricky Alan Jackson | 2017-07-25 |
| 9660603 | Sloped termination in molybdenum layers and method of fabricating | Neng Jiang, Nicholas Stephen Dellas | 2017-05-23 |
| 4737307 | Skin cleanser capable of removing smegma and surface bacteria, fungus and viruses from surface of skin | Robert Brown | 1988-04-12 |
| 4692262 | Skin cleanser capable of softening and removing smegma | Robert Brown | 1987-09-08 |