Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11798979 | Integrated capacitor with sidewall having reduced roughness | Elizabeth Costner Stewart, Jeffrey Alan West, Thomas D. Bonifield, Joseph A. Gallegos, Jay Sung Chun | 2023-10-24 |
| 11087451 | Generating multi-focal defect maps using optical tools | Elizabeth Costner Stewart, Young Sawk Oh, Jeffrey Alan West, Thomas D. Bonifield | 2021-08-10 |
| 10978548 | Integrated capacitor with sidewall having reduced roughness | Elizabeth Costner Stewart, Jeffrey Alan West, Thomas D. Bonifield, Joseph A. Gallegos, Jay Sung Chun | 2021-04-13 |
| 7169619 | Method for fabricating semiconductor structures on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process | Yong Liang, Ravindranath Droopad, Xiaoming Hu, Jun Wang, Yi Wei | 2007-01-30 |
| 7141857 | Semiconductor structures and methods of fabricating semiconductor structures comprising hafnium oxide modified with lanthanum, a lanthanide-series metal, or a combination thereof | Jay A. Curless, Yong Liang, Alexandra Navrotsky, Sergey Ushakov, Bich-Yen Nguyen +1 more | 2006-11-28 |
| 7045815 | Semiconductor structure exhibiting reduced leakage current and method of fabricating same | Ravindranath Droopad | 2006-05-16 |
| 6885065 | Ferromagnetic semiconductor structure and method for forming the same | Yong Liang, Ravindranath Droopad, Hao Li | 2005-04-26 |
| 6852588 | Methods of fabricating semiconductor structures comprising epitaxial Hf3Si2 layers | Jay A. Curless, Yong Liang | 2005-02-08 |
| 6806202 | Method of removing silicon oxide from a surface of a substrate | Xiaoming Hu, James Craigo, Ravindranath Droopad, John Edwards, Yong Liang +1 more | 2004-10-19 |
| 6750067 | Microelectronic piezoelectric structure and method of forming the same | Ramoothy Ramesh, Yu-Po Wang, Jeffrey M. Finder, Kurt Eisenbeiser, Ravindranath Droopad | 2004-06-15 |
| 6709989 | Method for fabricating a semiconductor structure including a metal oxide interface with silicon | Jamal Ramdani, Ravindranath Droopad | 2004-03-23 |
| 6693298 | Structure and method for fabricating epitaxial semiconductor on insulator (SOI) structures and devices utilizing the formation of a compliant substrate for materials used to form same | Kurt Eisenbeiser, Ravindranath Droopad | 2004-02-17 |
| 6693033 | Method of removing an amorphous oxide from a monocrystalline surface | John Edwards, Yi Wei, Dirk Jordan, Xiaoming Hu, James Craigo +2 more | 2004-02-17 |
| 6667196 | Method for real-time monitoring and controlling perovskite oxide film growth and semiconductor structure formed using the method | Ravindranath Droopad, Corey Overgaard | 2003-12-23 |
| 6501121 | Semiconductor structure | Jamal Ramdani, Ravindranath Droopad | 2002-12-31 |
| 6482538 | Microelectronic piezoelectric structure and method of forming the same | Ramamoorthy Ramesh, Yu-Po Wang, Jeffrey M. Finder, Ravindranath Droopad, Kurt Eisenbeiser | 2002-11-19 |
| 6479173 | Semiconductor structure having a crystalline alkaline earth metal silicon nitride/oxide interface with silicon | Jun Wang, Ravindranath Droopad, Alexander Demkov, Jerald A. Hallmark, Jamal Ramdani | 2002-11-12 |
| 6432546 | Microelectronic piezoelectric structure and method of forming the same | Ramoothy Ramesh, Yu-Po Wang, Jeffrey M. Finder, Kurt Eisenbeiser, Ravindranath Droopad | 2002-08-13 |
| 6319730 | Method of fabricating a semiconductor structure including a metal oxide interface | Jamal Ramdani, Ravindranath Droopad | 2001-11-20 |
| 6291319 | Method for fabricating a semiconductor structure having a stable crystalline interface with silicon | Jun Wang, Ravindranath Droopad, Jamal Ramdani | 2001-09-18 |
| 6270568 | Method for fabricating a semiconductor structure with reduced leakage current density | Ravindranath Droopad, Jamal Ramdani | 2001-08-07 |
| 6241821 | Method for fabricating a semiconductor structure having a crystalline alkaline earth metal oxide interface with silicon | Ravindranath Droopad, Corey Overgaard, Jamal Ramdani, Jay A. Curless, Jerald A. Hallmark +2 more | 2001-06-05 |
| 6159834 | Method of forming a gate quality oxide-compound semiconductor structure | Matthias Passlack, Brian Bowers, Corey Overgaard, Ravindranath Droopad, Jonathan K. Abrokwah | 2000-12-12 |