JL

Jeffrey M. Lauerhaas

TF Tel Fsi: 4 patents #8 of 33Top 25%
Northwestern University: 2 patents #821 of 3,846Top 25%
AT Akrion Technologies: 1 patents #7 of 12Top 60%
Dow Corning: 1 patents #971 of 1,768Top 55%
FI Fsi International: 1 patents #60 of 131Top 50%
IV Interuniversitair Micro-Electronica Centrum Vzw: 1 patents #167 of 450Top 40%
📍 Evanston, IL: #172 of 1,719 inventorsTop 15%
🗺 Illinois: #8,942 of 84,256 inventorsTop 15%
Overall (All Time): #505,525 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
10748788 System and method for monitoring treatment of microelectronic substrates with fluid sprays such as cryogenic fluid sprays Brent Schwab, Chimaobi W. Mbanaso, Gregory P. Thomes, Kevin Rolf 2020-08-18
9039840 Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation Jimmy D. Collins, Tracy A. Gast, Alan D. Rose 2015-05-26
8871108 Process for removing carbon material from substrates 2014-10-28
8684015 Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation Jimmy D. Collins, Tracy A. Gast, Alan D. Rose 2014-04-01
8235062 Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation Jimmy D. Collins, Tracy A. Gast, Alan D. Rose 2012-08-07
7100304 Megasonic cleaner and dryer Thomas Nicolosi, Paul Mertens, William Fyen 2006-09-05
6928751 Megasonic cleaner and dryer system Chad Michael Hosack, Mario E. Bran, Raoul Standt, Paul Patel, Yi Wu +2 more 2005-08-16
6754980 Megasonic cleaner and dryer Thomas Nicolosi, Paul Mertens, William Fyen 2004-06-29
5962132 Silica nanoparticles obtained from a method involving a direct current electric arc in an oxygen-containing atmosphere Robert P. H. Chang, Tobin J. Marks, Udo C. Pernisz 1999-10-05
5770022 Method of making silica nanoparticles Robert P. H. Chang, Tobin J. Marks, Udo C. Pernisz 1998-06-23