Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9673373 | System for delivering ultrasonic energy to a liquid and use for cleaning of solid parts | Steven Brems | 2017-06-06 |
| 9378989 | Method and apparatus for cleaning semiconductor substrates | Steven Brems, Elisabeth Camerotto, Marc Hauptmann | 2016-06-28 |
| 8324116 | Substrate treating method and method of manufacturing semiconductor device using the same | Rita Vos, Tom Schram, Masayuki Wada | 2012-12-04 |
| 8197604 | Method and apparatus for controlling optimal operation of acoustic cleaning | Steven Brems | 2012-06-12 |
| 7867565 | Method for coating substrates | Wim Fyen | 2011-01-11 |
| 7527698 | Method and apparatus for removing a liquid from a surface of a substrate | Frank Holsteyns, Marc Heyns | 2009-05-05 |
| 7521408 | Semiconductor cleaning solution | Rita Vos, Bernd Kolbesen, Albrecht Fester, Oliver Doll | 2009-04-21 |
| 7224433 | Method and apparatus for immersion lithography | Wim Fyen | 2007-05-29 |
| 7160482 | Composition comprising an oxidizing and complexing compound | Rita Vos, Albrecht Fester, Oliver Doll, Bernd Kolbesen | 2007-01-09 |
| 7100304 | Megasonic cleaner and dryer | Jeffrey M. Lauerhaas, Thomas Nicolosi, William Fyen | 2006-09-05 |
| 6928751 | Megasonic cleaner and dryer system | Chad Michael Hosack, Jeffrey M. Lauerhaas, Mario E. Bran, Raoul Standt, Paul Patel +2 more | 2005-08-16 |
| 6910487 | Method and apparatus for liquid-treating and drying a substrate | Marc Meuris | 2005-06-28 |
| 6863795 | Multi-step method for metal deposition | Ivo Teerlinck | 2005-03-08 |
| 6851435 | Method and apparatus for localized liquid treatment of the surface of a substrate | Marc Meuris, Marc Heyns | 2005-02-08 |
| 6821349 | Method and apparatus for removing a liquid from a surface | Marc Meuris, Marc Heyns | 2004-11-23 |
| 6754980 | Megasonic cleaner and dryer | Jeffrey M. Lauerhaas, Thomas Nicolosi, William Fyen | 2004-06-29 |
| 6676765 | Method of removing particles and a liquid from a surface of substrate | Mark Meuris, Marc Heyns | 2004-01-13 |
| 6632751 | Method and apparatus for liquid-treating and drying a substrate | Marc Meuris | 2003-10-14 |
| 6592676 | Chemical solution and method for reducing the metal contamination on the surface of a semiconductor substrate | Lee M. Loewenstein, Guy Vereecke | 2003-07-15 |
| 6568408 | Method and apparatus for removing a liquid from a surface of a rotating substrate | Mark Meuris, Marc Heyns | 2003-05-27 |
| 6551409 | Method for removing organic contaminants from a semiconductor surface | Stefan DeGendt, Dirk Maarten Knotter, Marc Heyns, Marc Meuris | 2003-04-22 |
| 6530385 | Apparatus and method for wet cleaning or etching a flat substrate | Marc Meuris, Marc Heyns | 2003-03-11 |
| 6491764 | Method and apparatus for removing a liquid from a surface of a rotating substrate | Mark Meuris, Marc Heyns | 2002-12-10 |
| 6472294 | Semiconductor processing method for processing discrete pieces of substrate to form electronic devices | Marc Meuris, Marc Heyns | 2002-10-29 |
| 6398975 | Method and apparatus for localized liquid treatment of the surface of a substrate | Marc Meuris, Marc Heyns | 2002-06-04 |