Issued Patents All Time
Showing 26–50 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11011641 | Flat STI surface for gate oxide uniformity in Fin FET devices | Cheng-Ta Wu, Cheng-Wei Chen, Shiu-Ko JangJian | 2021-05-18 |
| 10998194 | Metal gate stack having TaAlCN layer | Shiu-Ko JangJian, Chi-Cherng Jeng, Chi-Wen Liu | 2021-05-04 |
| 10984286 | Domain stylization using a neural network model | Aysegul Dundar, Ming-Yu Liu, John Zedlewski, Jan Kautz | 2021-04-20 |
| 10886226 | Conductive contact having staircase barrier layers | Chia-Yang Wu, Shiu-Ko JangJian, Yung-Si Yu | 2021-01-05 |
| 10763338 | Silicide implants | Chia-Yang Wu, Shiu-Ko Jang-Jian, Chuan-Pu Liu | 2020-09-01 |
| 10629708 | Semiconductor device structure with barrier layer and method for forming the same | Chia-Yang Wu, Shiu-Ko JangJian, Yung-Si Yu | 2020-04-21 |
| 10529863 | Flat STI surface for gate oxide uniformity in Fin FET devices | Cheng-Ta Wu, Cheng-Wei Chen, Shiu-Ko JangJian | 2020-01-07 |
| 10504998 | Semiconductor structure and method of forming the same | Cheng-Ta Wu, Yi-Hsien Lee, Wei-Ming You | 2019-12-10 |
| 10483112 | Metal gate stack having TaAlCN layer | Shiu-Ko JangJian, Chi-Cherng Jeng, Chi-Wen Liu | 2019-11-19 |
| 10453933 | Barrier layer for dielectric layers in semiconductor devices | Sheng-Wen Chen, Yu-Ting Lin, Che-Hao Chang, Wei-Ming You | 2019-10-22 |
| 10438893 | Metal interconnect structure and method for fabricating the same | Shih-Hsien Chen, Meng-Jun Wang, Chih-Sheng Chang | 2019-10-08 |
| 10192988 | Flat STI surface for gate oxide uniformity in Fin FET devices | Cheng-Ta Wu, Shiu-Ko JangJian, Cheng-Wei Chen | 2019-01-29 |
| 10192985 | FinFET with doped isolation insulating layer | Cheng-Ta Wu, Wei-Ming You, J. W. Wu | 2019-01-29 |
| 10141413 | Wafer strength by control of uniformity of edge bulk micro defects | I-Che Huang, Pu Chen | 2018-11-27 |
| 10103267 | Method of forming FinFET gate oxide | Cheng-Ta Wu, Yuan Chen | 2018-10-16 |
| 10062787 | FinFET | Yu-Ting Hsiao, Cheng-Ta Wu, Lun-Kuang Tan, Liang-Yu Yen, Tsung-Han Wu +1 more | 2018-08-28 |
| 10032634 | Metal gate stack having TaAlCN layer | Shiu-Ko JangJian, Chi-Cherng Jeng, Chi-Wen Liu | 2018-07-24 |
| 10026838 | Fin-type field effect transistor and manufacturing method thereof | Cheng-Ta Wu, Yung-Yu Wang, Yung-Hsiang Chan, Chia-Ying Tsai | 2018-07-17 |
| 9985133 | Protection layer on fin of fin field effect transistor (FinFET) device structure | Shiu-Ko JangJian, Chi-Cherng Jeng, Chih-Nan Wu, Chun Che Lin | 2018-05-29 |
| 9893185 | Fin field effect transistor and method for fabricating the same | Cheng-Ta Wu, Yu-Ting Lin, Po-Kai Hsiao, Po-Kang Ho | 2018-02-13 |
| 9876114 | Structure and method for 3D FinFET metal gate | Shiu-Ko JangJian, Chih-Nan Wu, Chun Che Lin | 2018-01-23 |
| 9768261 | Semiconductor structure and method of forming the same | Cheng-Ta Wu, Yi-Hsien Lee, Wei-Ming You | 2017-09-19 |
| 9728646 | Flat STI surface for gate oxide uniformity in Fin FET devices | Cheng-Ta Wu, Shiu-Ko JangJian, Cheng-Wei Chen | 2017-08-08 |
| 9716090 | FinFet structure | Cheng-Ta Wu, Cheng-Wei Chen, Hong-Yi Wu, Shiu-Ko JangJian, Wei-Ming You | 2017-07-25 |
| 9697989 | Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method | Cheng-Ta Wu, Tsung-Han Wu, Yao-Wen Hsu, Lun-Kuang Tan, Wei-Ming You | 2017-07-04 |