LL

Lu Liu

TSMC: 5 patents #4,208 of 12,232Top 35%
UM United Microelectronics: 4 patents #1,253 of 4,560Top 30%
NT Nanjing University Of Posts And Telecommunications: 3 patents #25 of 214Top 15%
NT National University Of Defense Technology: 2 patents #43 of 310Top 15%
CC Chongqing Gigachip Technology Co.: 2 patents #15 of 38Top 40%
LU Ludong University: 2 patents #12 of 59Top 25%
NT North China University Of Technology: 1 patents #3 of 29Top 15%
NC National Science Council: 1 patents #238 of 867Top 30%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
US Utek Semiconductor: 1 patents #3 of 26Top 15%
📍 Tianjin, MI: #2 of 10 inventorsTop 20%
Overall (All Time): #115,634 of 4,157,543Top 3%
31
Patents All Time

Issued Patents All Time

Showing 26–31 of 31 patents

Patent #TitleCo-InventorsDate
6004873 Method for reducing the pattern sensitivity of ozone assisted chemical vapor deposited (CVD) silicon oxide insulator layers Syun-Ming Jang 1999-12-21
5804498 Method of making an underlayer to reduce pattern sensitivity of ozone-TEOS Syun-Ming Jang, Lung Chen 1998-09-08
5723380 Method of approach to improve metal lithography and via-plug integration Chin-Kun Wang 1998-03-03
5670016 Method for cleaning substrate prior to tungsten deposition Mao-Chieh Chen, Wen-Kuan Yeh, Pei-Jan Wang 1997-09-23
5563104 Reduction of pattern sensitivity in ozone-teos deposition via a two-step (low and high temperature) process Syun-Ming Jang 1996-10-08
5536681 PE-OX/ozone-TEOS gap filling capability by selective N.sub.2 treatment on PE-OX Syun-Ming Jang 1996-07-16