Issued Patents All Time
Showing 401–414 of 414 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9450099 | Structure and formation method of semiconductor device structure | Che-Cheng Chang, Chen-Hsiang Lu, Wei-Ting Chen, Yu-Cheng Liu | 2016-09-20 |
| 9406680 | Semiconductor device including fin structures and manufacturing method thereof | Che-Cheng Chang, Jr-Jung Lin | 2016-08-02 |
| 9401415 | Fin field effect transistor (FinFET) device and method for forming the same | Che-Cheng Chang, Chang-Yin Chen, Jr-Jung Lin, Yung-Jung Chang | 2016-07-26 |
| 9391205 | Gate last semiconductor structure and method for forming the same | Che-Cheng Chang, Jr-Jung Lin | 2016-07-12 |
| 9384988 | Gate protection caps and method of forming the same | Jr-Jung Lin, Ming-Ching Chang, Chao-Cheng Chen | 2016-07-05 |
| 9331074 | Semiconductor device and manufacturing method thereof | Che-Cheng Chang | 2016-05-03 |
| 9306037 | Dummy gate electrode of semiconductor device | Jr-Jung Lin, Ming-Ching Chang | 2016-04-05 |
| 9245883 | Method of making a FinFET device | Jr-Jung Lin, Ming-Ching Chang, Chao-Cheng Chen | 2016-01-26 |
| 9153440 | Method of forming a semiconductor device | Ming-Ching Chang, Ryan Chia-Jen Chen, Yih-Ann Lin, Jr-Jung Lin | 2015-10-06 |
| 9041125 | Fin shape for fin field-effect transistors and method of forming | Jr-Jung Lin, Ming-Ching Chang, Chao-Cheng Chen | 2015-05-26 |
| 8803241 | Dummy gate electrode of semiconductor device | Jr-Jung Lin, Ming-Ching Chang | 2014-08-12 |
| 8722541 | Double patterning method for semiconductor devices | — | 2014-05-13 |
| 8163625 | Method for fabricating an isolation structure | Yih-Ann Lin, Hao-Ming Lien, Ryan Chia-Jen Chen, Jr-Jung Lin, Yu-Chao Lin | 2012-04-24 |
| 8034722 | Method of forming dual damascene semiconductor device | Kun-Ei Chen | 2011-10-11 |