Issued Patents All Time
Showing 51–71 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10495868 | Sample carrying module and portable microscope using the same | Chang-Yu Chen, Tsun-Chao CHIANG, Shu-Sheng LIN | 2019-12-03 |
| 10459332 | Mask blank and fabrication method thereof, and method of fabricating photomask | Hao-Ming Chang, Chih-Ming Chen, Sheng-Chang Hsu, Shao-Chi Wei, Hsao Shih +1 more | 2019-10-29 |
| 10288869 | Reflecting microscope module and reflecting microscope device | Chang-Yu Chen, Tsun-Chao CHIANG, Shu-Sheng LIN | 2019-05-14 |
| 10281708 | Microscope module and microscope device | Chang-Yu Chen, Shu-Sheng LIN, Tsun-Chao CHIANG | 2019-05-07 |
| 10101651 | Photo mask assembly and optical apparatus including the same | Shao-Chi Wei, Sheng-Chang Hsu, Yu-Hsin Hsu, Hao-Ming Chang | 2018-10-16 |
| 9900558 | Microscope module and microscope device | Shu-Sheng LIN, Chang-Yu Chen, Tsun-Chao CHIANG | 2018-02-20 |
| 8792078 | Method and pellicle mounting apparatus for reducing pellicle induced distortion | Chien-Chao Huang, Jong-Yuh Chang, Chia-Wei Chang, Boming Hsu | 2014-07-29 |
| 8383324 | Mask registration correction | — | 2013-02-26 |
| 8268541 | Mask and blank storage inner gas | Chue-San Yoo | 2012-09-18 |
| 8158015 | Fitting methodology of etching times determination for a mask to provide critical dimension and phase control | Joy Huang | 2012-04-17 |
| 7923265 | Method and system for improving critical dimension proximity control of patterns on a mask or wafer | Jen-His Chiu | 2011-04-12 |
| 7917244 | Method and system for reducing critical dimension side-to-side tilting error | Chai-Wei Chang | 2011-03-29 |
| 7393617 | Single trench repair method with etched quartz for attenuated phase shifting mask | — | 2008-07-01 |
| 7361418 | Luminary material and method for manufacturing the same | Chung-Chih Feng, Yuan-Fang Tsai, Chien-Chia Huang | 2008-04-22 |
| 7226706 | Modification of mask blank to avoid charging effect | — | 2007-06-05 |
| 7157191 | Single trench repair method with etched quartz for attenuated phase shifting mask | — | 2007-01-02 |
| 7029802 | Embedded bi-layer structure for attenuated phase shifting mask | — | 2006-04-18 |
| 7008730 | Application of high transmittance attenuating phase shifting mask with dark tone for sub-0.1 micrometer logic device contact hole pattern in 193 NM lithography | — | 2006-03-07 |
| 6982134 | Multiple stepped aperture repair of transparent photomask substrates | — | 2006-01-03 |
| 6905802 | Multiple exposure method for forming a patterned photoresist layer | — | 2005-06-14 |
| 6872496 | AlSixOy as a new bi-layer high transmittance attenuating phase shifting mask material for 193 nanometer lithography | — | 2005-03-29 |