Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12128455 | Electrical cleaning tool for wafer polishing tool system | Chih-Wen Liu, Yeo-Sin Lin, Shu-Wei Hsu, Hui-Chi Huang, Kei-Wei Chen | 2024-10-29 |
| 12068196 | Forming gate line-end of semiconductor structures with improved metal gate height | Che-Liang Chung, Kei-Wei Chen, Chih-Wen Liu, You-Shiang Lin, Yi-Ching Liang | 2024-08-20 |
| 11951587 | Zone-based CMP target control | Che-Liang Chung, Kei-Wei Chen, Chih-Wen Liu | 2024-04-09 |
| 11854821 | Hard mask removal method | William Weilun Hong, Ying-Tsung Chen | 2023-12-26 |
| 10971370 | Hard mask removal method | William Weilun Hong, Ying-Tsung Chen | 2021-04-06 |
| 10943822 | Forming gate line-end of semiconductor structures | Che-Liang Chung, Kei-Wei Chen, Chih-Wen Liu, You-Shiang Lin, Yi-Ching Liang | 2021-03-09 |
| 10800004 | System and method of chemical mechanical polishing | Chih-Wen Liu, Hao-Yun Cheng, Kei-Wei Chen | 2020-10-13 |
| 10510552 | Hard mask removal method | William Weilun Hong, Ying-Tsung Chen | 2019-12-17 |
| 9960050 | Hard mask removal method | William Weilun Hong, Ying-Tsung Chen | 2018-05-01 |
| 9941109 | Surface treatment in a chemical mechanical process | Chih-Wen Liu, Po-Chin Nien, William Weilun Hong, Ying-Tsung Chen | 2018-04-10 |
| 9922837 | Asymmetric application of pressure to a wafer during a CMP process | Chih-Wen Liu, Po-Chin Nien, William Weilun Hong, Ying-Tsung Chen | 2018-03-20 |
| 9711374 | Mechanisms for forming oxide layer over exposed polysilicon during a chemical mechanical polishing (CMP) process | Chih-Yu Chang, William Weilun Hong, Ying-Tsung Chen | 2017-07-18 |
| 9595450 | Composite structure for gate level inter-layer dielectric | William Weilun Hong, Ying-Tsung Chen | 2017-03-14 |
| 8975179 | Planarization process for semiconductor device fabrication | Weilun Hong, Ying-Tsung Chen, Liang-Guang Chen | 2015-03-10 |
| 8598028 | Gate height loss improvement for a transistor | Chi-Jen Liu, Tzu-Chung Wang, Weilun Hong, Ying-Tsung Chen, Liang-Guang Chen | 2013-12-03 |