XL

Xi-Wei Lin

SY Synopsys: 38 patents #7 of 2,302Top 1%
VT Vlsi Technology: 25 patents #6 of 594Top 2%
S( Semiconductor Manufacturing International (Shanghai): 6 patents #97 of 1,122Top 9%
Philips: 5 patents #1,000 of 7,731Top 15%
FC Fu Tai Hua Industry (Shenzhen) Co.: 2 patents #160 of 543Top 30%
Foxconn: 2 patents #2,169 of 5,504Top 40%
VT Vlsip Technologies: 1 patents #1 of 9Top 15%
NB Nxp B.V.: 1 patents #1,722 of 3,591Top 50%
PA Philips Electronics No. America: 1 patents #3 of 12Top 25%
PS Philips Semiconductors: 1 patents #15 of 64Top 25%
📍 Fremont, CA: #108 of 9,298 inventorsTop 2%
🗺 California: #3,414 of 386,348 inventorsTop 1%
Overall (All Time): #22,662 of 4,157,543Top 1%
80
Patents All Time

Issued Patents All Time

Showing 51–75 of 80 patents

Patent #TitleCo-InventorsDate
6420273 Self-aligned etch-stop layer formation for semiconductor devices 2002-07-16
6414542 Integrated circuit with relative sense inversion of signals along adjacent parallel signal paths Dipankar Pramanik 2002-07-02
6358777 Spectrally detectable low-k dielectric marker layer for plasma-etch of integrated-circuit structure 2002-03-19
6316834 Tungsten plugs for integrated circuits and method for making same Calvin T. Gabriel, Dipankar Pramanik 2001-11-13
6309937 Method of making shallow junction semiconductor devices 2001-10-30
6309948 Method for fabrication of a semiconductor device Henry Lee, Ian Robert Harvey 2001-10-30
6303504 Method of improving process robustness of nickel salicide in semiconductors 2001-10-16
6265252 Reducing the formation of electrical leakage pathways during manufacture of an electronic device 2001-07-24
6228707 Semiconductor arrangement having capacitive structure and manufacture thereof 2001-05-08
6218303 Via formation using oxide reduction of underlying copper 2001-04-17
6207543 Metallization technique for gate electrodes and local interconnects Ian Robert Harvey 2001-03-27
6153456 Method of selectively applying dopants to an integrated circuit semiconductor device without using a mask Emmanual de Muizon 2000-11-28
6150266 Local interconnect formed using silicon spacer Emmanuel de Muizon 2000-11-21
6143613 Selective exclusion of silicide formation to make polysilicon resistors 2000-11-07
6093656 Method of minimizing dishing during chemical mechanical polishing of semiconductor metals for making a semiconductor device 2000-07-25
6084464 On-chip decoupling capacitor system with parallel fuse 2000-07-04
6074921 Self-aligned processing of semiconductor device features 2000-06-13
6060376 Integrated etch process for polysilicon/metal gate Calvin T. Gabriel, Tammy Zheng, Linda Leard, Ian Robert Harvey 2000-05-09
5990561 Tungsten plugs for integrated circuits and methods for making same Calvin T. Gabriel, Dipankar Pramanik 1999-11-23
5985749 Method of forming a via hole structure including CVD tungsten silicide barrier layer Subhas Bothra 1999-11-16
5963784 Methods of determining parameters of a semiconductor device and the width of an insulative spacer of a semiconductor device Subhas Bothra 1999-10-05
5953612 Self-aligned silicidation technique to independently form silicides of different thickness on a semiconductor device Milind Weling 1999-09-14
5933739 Self-aligned silicidation structure and method of formation thereof 1999-08-03
5895245 Plasma ash for silicon surface preparation Ian Robert Harvey, Ramiro Solis 1999-04-20
5883011 Method of removing an inorganic antireflective coating from a semiconductor substrate Satyendra Sethi, Henry Lee 1999-03-16