Issued Patents All Time
Showing 26–50 of 168 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7550253 | Barrier film material and pattern formation method using the same | Masaru Sasago | 2009-06-23 |
| 7541132 | Chemically amplified resist material, topcoat film material and pattern formation method using the same | Masaru Sasago | 2009-06-02 |
| 7524772 | Pattern formation method | Masaru Sasago | 2009-04-28 |
| 7488567 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Kazuhiko Maeda +2 more | 2009-02-10 |
| 7470501 | Pattern formation method through liquid immersion lithography | Masaru Sasago | 2008-12-30 |
| 7462438 | Resist material and pattern formation method using the same | Masaru Sasago | 2008-12-09 |
| 7455950 | Resist material and pattern formation method using the same | Masaru Sasago | 2008-11-25 |
| 7429778 | Methods for forming wiring and electrode | Yasuaki Yokoyama, Takashi Satoh, Tamaki Wakasaki, Yasumasa Takeuchi, Isamu Yonekura | 2008-09-30 |
| 7413843 | Sulfonamide compound, polymer compound, resist material and pattern formation method | Shinji Kishimura, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara | 2008-08-19 |
| 7393794 | Pattern formation method | Masaru Sasago | 2008-07-01 |
| 7378216 | Resist material and pattern formation method | Shinji Kishimura, Masaru Sasago, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara | 2008-05-27 |
| 7378229 | Pattern formation method | Masaru Sasago | 2008-05-27 |
| 7378218 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Kazuhiko Maeda +2 more | 2008-05-27 |
| 7374857 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | Tsuneaki Maesawa, Fumiyoshi Urano, Masaru Sasago | 2008-05-20 |
| 7338743 | Resist material and pattern formation method | Masaru Sasago | 2008-03-04 |
| 7314703 | Chemically amplified resist material and pattern formation method using the same | Masaru Sasago | 2008-01-01 |
| 7273820 | Method for fabricating semiconductor device | Hideo Nakagawa, Masaru Sasago, Yoshihiko Hirai | 2007-09-25 |
| 7255974 | Pattern formation method | Masaru Sasago | 2007-08-14 |
| 7241553 | Polymer, resist composition, and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masaru Sasago, Shinji Kishimura +3 more | 2007-07-10 |
| D543625 | Syringe | Shigeki Numata | 2007-05-29 |
| D543279 | Syringe | Shigeki Numata | 2007-05-22 |
| D543278 | Syringe | Shigeki Numata | 2007-05-22 |
| 7198888 | Water-soluble material, chemically amplified resist and pattern formation method using the same | Masaru Sasago | 2007-04-03 |
| 7195860 | Semiconductor manufacturing apparatus and pattern formation method | Masaru Sasago | 2007-03-27 |
| 7169869 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Shinji Kishimura +3 more | 2007-01-30 |