Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8573969 | Silicon wafer heat treatment method | Shinya Sadohara, Kozo Nakamura | 2013-11-05 |
| 8246744 | Method for predicting precipitation behavior of oxygen in silicon single crystal, method for determining production parameter of silicon single crystal, and storage medium for storing program for predicting precipitation behavior of oxygen in silicon single crystal | Kozo Nakamura, Junsuke Tomioka, Tetsuro Akagi | 2012-08-21 |
| 7875116 | Silicon single crystal producing method, annealed wafer, and method of producing annealed wafer | Shinya Sadohara, Ryota Suewaka, Kozo Nakamura, Yutaka Shiraishi, Syunji Nonaka | 2011-01-25 |
| 7759227 | Silicon semiconductor substrate heat-treatment method and silicon semiconductor substrate treated by the method | Susumu Maeda, Takahisa Sugiman, Shinya Sadohara, Kouzo Nakamura | 2010-07-20 |
| 7226505 | Method for vanishing defects in single crystal silicon and single crystal silicon | Masahiko Ando, Masaru Yuyama | 2007-06-05 |
| 6800132 | Silicon wafer and method for manufacture thereof, and method for evaluation of silicon wafer | Satoshi Komiya, Masayoshi Danbata, Kouichirou Hayashida | 2004-10-05 |
| 5708365 | Method for analysis of silicon wafers | Seiichi Shimura, Mitsuo Kono | 1998-01-13 |
| 5385115 | Semiconductor wafer heat treatment method | Junsuke Tomioka, Tetsuro Akagi | 1995-01-31 |