Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7763394 | Protected pattern mask for reflection lithography in the extreme UV or soft X-ray range | — | 2010-07-27 |
| 7714992 | Equipment and method for monitoring an immersion lithography device | Jean-Philippe Piel | 2010-05-11 |
| 7230701 | Compact spectroscopic ellipsometer | Jean-Philippe Piel, Pierre Boher, Luc Tantart, Jean-Pierre Rey | 2007-06-12 |
| 6734967 | Focused beam spectroscopic ellipsometry method and system | Timothy R. Piwonka-Corle, Karen Scoffone, Xing Chen, Lloyd J. LaComb, JR., Dorian Zahorski +1 more | 2004-05-11 |
| 6687002 | Method and apparatus for ellipsometric metrology for a sample contained in a chamber or the like | Pierre Boher | 2004-02-03 |
| 5991037 | High spatial resolution ellipsometry device | Jean-Philippe Piel, Dorian Zahorski | 1999-11-23 |
| 5910842 | Focused beam spectroscopic ellipsometry method and system | Timothy R. Piwonka-Corle, Xing Chen, Lloyd J. LaComb, JR., Dorian Zahorski | 1999-06-08 |
| 5608526 | Focused beam spectroscopic ellipsometry method and system | Timothy R. Piwonka-Corle, Karen Scoffone, Xing Chen, Lloyd J. LaComb, JR., Dorian Zahorski +1 more | 1997-03-04 |
| 5329357 | Spectroscopic ellipsometry apparatus including an optical fiber | Franck Bernoux | 1994-07-12 |