Issued Patents All Time
Showing 51–75 of 83 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5998662 | O-amino (thio) phenolcarboxylic acids and their preparation | Michael Keitmann | 1999-12-07 |
| 5973202 | Preparation of poly-o-hydroxyamides and poly o-mercaptoamides | Hellmut Ahne, Eva Rissel, Kurt Geibel | 1999-10-26 |
| 5922825 | Preparation of poly-o-hydroxyamides and poly o-mercaptoamides | Hellmut Ahne, Eberhard Kuehn | 1999-07-13 |
| 5883221 | Synthesis of polybenzoxasole and polybenzothiazole precursors | Eberhard Kuehn, Hellmut Ahne, Sueleyman Kocman | 1999-03-16 |
| 5863705 | Photolithographic pattern generation | Rainer Leuschner, Erwin Schmidt | 1999-01-26 |
| 5851733 | Photolithographic pattern generation | Rainer Leuschner, Erwin Schmidt | 1998-12-22 |
| 5807969 | Preparation of poly-O-hydroxyamides and poly O-mercaptoamides | Hellmut Ahne, Eberhard Kuehn, Roland Gestigkeit | 1998-09-15 |
| 5783654 | Preparation of poly-O-hydroxyamides and poly O-mercaptoamides | Hellmut Ahne | 1998-07-21 |
| 5777066 | Method for the production of poly-o-hydroxyamides | Hellmut Ahne, Eva Rissel | 1998-07-07 |
| 5760162 | Preparation of poly-o-hydroxyamides and poly-o-mercaptoamides | Hellmut Ahne, Roland Gestigkeit, Kurt Geibel | 1998-06-02 |
| 5750638 | Method for the production of poly-o-hydroxyamides | Hellmut Ahne, Roland Gestigkeit | 1998-05-12 |
| 5733706 | Dry-developable positive resist | Rainer Leuschner, Horst Borndorfer, Eva Rissel, Michael Sebald, Hellmut Ahne +2 more | 1998-03-31 |
| 5726279 | Preparation of poly-o-hydroxyamides and poly o-mercaptoamides | Hellmut Ahne | 1998-03-10 |
| 5703186 | Mixed polymers | Horst Borndoerfer, Hellmut Ahne, Siegfried Birkle, Eberhard Kuehn, Rainer Leuschner +2 more | 1997-12-30 |
| 5696218 | Preparation of poly-o-hydroxyamides and poly-o-mercaptoamides | Hellmut Ahne, Roland Gestigkeit | 1997-12-09 |
| 5688631 | Methods for producing polybenzoxazol precursors and corresponding resist solutions | Hellmut Ahne, Eva Rissel | 1997-11-18 |
| 5616667 | Copolymers | Horst Borndoerfer, Hellmut Ahne, Siegfried Birkle, Eberhard Kuehn, Rainer Leuschner +2 more | 1997-04-01 |
| 5556812 | Connection and build-up technique for multichip modules | Rainer Leuschner, Hellmut Ahne, Siegfried Birkle, Albert Hammerschmidt, Tobias Noll +1 more | 1996-09-17 |
| 5512334 | Method for the production of a bottom resist | Rainer Leuschner, Michael Sebald | 1996-04-30 |
| 5384220 | Production of photolithographic structures | Horst Borndoerfer, Rainer Leuschner, Michael Sebald, Siegfried Birkle, Hellmut Ahne | 1995-01-24 |
| 5368901 | Method for the production of a bottom resist | Rainer Leuschner, Michael Sebald | 1994-11-29 |
| 5360693 | Positive o-quinone diazide photoresist containing base copolymer utilizing monomer having anhydride function and further monomer that increases etch resistance | Michael Sebald, Rainer Leuschner, Seigfried Birkle, Hellmut Ahhe | 1994-11-01 |
| 5275920 | Method of dry development utilizing quinone diazide and basic polymer resist with latent image intensification through treatment with silicon-organic compound in water | Rainer Leuschner, Michael Sebald, Siegfried Birkle, Hellmut Ahne | 1994-01-04 |
| 5262283 | Method for producing a resist structure | Horst Borndorfer, Eva Rissel, Rainer Leuschner, Michael Sebald, Hellmut Ahne +1 more | 1993-11-16 |
| 5250375 | Photostructuring process | Michael Sebald, Juergen Beck, Rainer Leuschner, Siegfried Birkle, Hellmut Ahne +1 more | 1993-10-05 |