MS

Michito Sato

SC Shin-Etsu Handotai Co.: 13 patents #48 of 679Top 8%
SE Seh-America: 4 patents #13 of 140Top 10%
FM Fujikoshi Machinery: 3 patents #26 of 85Top 35%
FH Fujibo Holdings: 1 patents #18 of 35Top 55%
TC The Lion Fat & Oil Co.: 1 patents #21 of 52Top 45%
📍 Shirakawa, WA: #2 of 3 inventorsTop 70%
Overall (All Time): #237,029 of 4,157,543Top 6%
19
Patents All Time

Issued Patents All Time

Showing 1–19 of 19 patents

Patent #TitleCo-InventorsDate
10850365 Polishing apparatus with a waste liquid receiver Junichi Ueno, Kaoru Ishii, Yosuke KANAI, Yuya Nakanishi 2020-12-01
10737365 Turn table transport carriage Yosuke KANAI 2020-08-11
10661410 Method for measuring template and method for evaluating same 2020-05-26
10537972 Polishing method and polishing apparatus Junichi Ueno, Kaoru Ishii 2020-01-21
10532442 Polishing apparatus and wafer polishing method Junichi Ueno, Kaoru Ishii, Hiromi Kishida, Yuya Nakanishi, Ryosuke Yoda +1 more 2020-01-14
10464189 Method for manufacturing polishing head, polishing head, and polishing apparatus Masaaki OSEKI 2019-11-05
10414017 Polishing apparatus Junichi Ueno, Kaoru Ishii, Hiromi Kishida, Yosuke KANAI, Yuya Nakanishi 2019-09-17
10300576 Polishing method Masaaki OSEKI, Kaoru Ishii 2019-05-28
10201886 Polishing pad and method for manufacturing the same Junichi Ueno, Kaoru Ishii, Yoshihide Kawamura, Hiroshi Yoshida, Masataka Takagi 2019-02-12
10043673 Final polishing method of silicon wafer and silicon wafer 2018-08-07
9981361 Apparatus for dressing urethane foam pad for use in polishing Junichi Ueno, Kaoru Ishii 2018-05-29
9076750 Semiconductor wafer and manufacturing method thereof 2015-07-07
6503363 System for reducing wafer contamination using freshly, conditioned alkaline etching solution Masami Nakano, Brian West 2003-01-07
6457929 Apparatus and method for automatically transferring wafers between wafer holders in a liquid environment Hiroaki Fukabori, Yukio Mukaino 2002-10-01
6354794 Method for automatically transferring wafers between wafer holders in a liquid environment Hiroaki Fukabori, Yukio Mukaino 2002-03-12
6063205 Use of H.sub.2 O.sub.2 solution as a method of post lap cleaning Steven Cooper 2000-05-16
5764353 Back side damage monitoring system Naoto Tate, Eva Brown 1998-06-09
5211794 Wafer etching apparatus Tatsuo Enomoto, Shigeyoshi Nezu 1993-05-18
4248801 Process for the production of tertiary amine having long chain alkyl group Susumu Tomidokoro, Daini Saika 1981-02-03