Issued Patents All Time
Showing 26–50 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7739492 | Encrypted communication for selectively delivering a message to multiple decrypting devices | — | 2010-06-15 |
| 7672619 | Wire bar, method of manufacturing wire bar, and image forming apparatus | Hidehiro Takano, Ken Ikuma | 2010-03-02 |
| 7620806 | Encrypted communication for selectively delivering a message to multiple decrypting devices | — | 2009-11-17 |
| 7590368 | Image forming apparatus and method of cleaning intermediate transfer belt | Ken Ikuma | 2009-09-15 |
| 7561815 | Image forming apparatus that controls development conditions based on paper type | Ken Ikuma | 2009-07-14 |
| 7493065 | Wire bar, method of manufacturing wire bar, and image forming apparatus | Hidehiro Takano, Ken Ikuma | 2009-02-17 |
| 7336887 | Content play back, information processing, and play back restriction | Akashi Satoh | 2008-02-26 |
| 7295615 | System for embedding additional information in video data, and embedding method | Shuichi Shimizu, Norishige Morimoto | 2007-11-13 |
| 7177576 | Apparatus for forming image using liquid development | Hidehiro Takano, Ken Ikuma | 2007-02-13 |
| 7149459 | Application roller and image forming apparatus | Hidehiro Takano, Ken Ikuma | 2006-12-12 |
| 7106882 | Data embedding, detection, and processing | — | 2006-09-12 |
| 7093299 | System for authenticating digital data | Norishige Morimoto, Akio Koide, Tohru Sakakura | 2006-08-15 |
| 6830852 | Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles | Shintaro Kawata, Shinichi Takahashi | 2004-12-14 |
| 6815693 | Charged-particle-beam microlithography apparatus and methods including proximity-effect correction | Kazuya Okamoto, Teruaki Okino | 2004-11-09 |
| 6654106 | Methods and apparatus for determining blur of an optical system | — | 2003-11-25 |
| 6642532 | Methods for determining a pattern on a microlithography reticle to minimize proximity effects in pattern elements in chips located on substrate periphery | — | 2003-11-04 |
| 6635881 | Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same | Atsushi Yamada, Hiroyasu Simizu | 2003-10-21 |
| 6566663 | Charged-particle-beam optical components and systems including ferrite exhibiting reduced image displacement from temperature fluctuations | Shinichi Kojima, Katsushi Nakano, Kazuya Okamoto | 2003-05-20 |
| 6531251 | Proximity effect correction methods | — | 2003-03-11 |
| 6507027 | Apparatus and methods for charged-particle-beam microlithography exhibiting reduced four-fold aberrations | Shinichi Kojima | 2003-01-14 |
| 6501083 | Methods for calculating cumulative dose of exposure energy from regions of a microlithography reticle for use in correcting proximity effects | — | 2002-12-31 |
| 6489620 | Astigmatism-correction device and charged-particle-beam microlithography apparatus and methods comprising same | — | 2002-12-03 |
| 6432594 | Devices for reducing deflection aberrations in charged-particle-beam optical systems and microlithography apparatus comprising same, and related methods | — | 2002-08-13 |
| 6255663 | Charged particle beam exposure apparatus and semiconductor device manufacturing method | Atsushi Yamada | 2001-07-03 |
| 6194102 | Pattern-transfer methods and masks | Mamoru Nakasuji | 2001-02-27 |