Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6906336 | Methods for reducing blur and variation in blur in projected images produced by charged-particle-beam microlithography | — | 2005-06-14 |
| 6635881 | Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same | Atsushi Yamada, Koichi Kamijo | 2003-10-21 |
| 6627899 | Magnetic lenses, charged-particle-beam optical systems, and charged-particle-beam pattern-transfer apparatus | — | 2003-09-30 |
| 6621090 | Electron-beam sources exhibiting reduced spherical aberration, and microlithography apparatus comprising same | — | 2003-09-16 |
| 6608313 | Methods and devices for achieving alignment of a beam-propagation axis with a center of an aperture in a charged-particle-beam optical system | — | 2003-08-19 |
| 6545282 | Apparatus and methods for reducing Coulombic blur in charged-particle-beam microlithography | — | 2003-04-08 |
| 6087668 | Charged-particle-beam projection method and apparatus | — | 2000-07-11 |
| 6066855 | Charged-particle-beam optical system exhibiting aberration correction | — | 2000-05-23 |
| 6049084 | Charged-particle-beam optical system | — | 2000-04-11 |
| 6008498 | Charged particle beam apparatus and method of using the same | — | 1999-12-28 |
| 5853043 | Method and apparatus for continuous casting of a thin slab | Isamu Takeuchi, Akihiro Yamanaka, Kazuo Okamura, Takasi Kanazawa, Seiji Kumakura +3 more | 1998-12-29 |
| 5747819 | Charged particle beam transfer device exhibiting low aberration | Mamoru Nakasuji | 1998-05-05 |