Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11714347 | Process proximity correction method and the computing device for the same | Soo-Yong LEE, Min-Cheol Kang, U Seong Kim, Jee Yong LEE | 2023-08-01 |
| 10126646 | Method of calculating a shift value of a cell contact | Ki Ho Yang, Sibo Cai | 2018-11-13 |
| 9703189 | Method of calculating a shift vale of a cell contact | Ki Ho Yang, Sibo Cai | 2017-07-11 |
| 9542740 | Method for detecting defect in pattern | Ki Hyun Kim, Kai-Yuan CHI, Dmitry Vengertsev | 2017-01-10 |
| 8677288 | Test pattern selection method for OPC model calibration | Dmitry Vengertsev, Seong Ho Moon, Artem Shamsuarov, Moon-Gyu Jeong | 2014-03-18 |
| 8614034 | Method of manufacturing photo-mask | Seong Ho Moon, Artem Shamsuarov, Seong Bo Shim | 2013-12-24 |
| 7185312 | Exposure method for correcting line width variation in a photomask | Won-tai Ki, Ji-Hyeon Choi | 2007-02-27 |
| 7061582 | Exposure apparatus including micro mirror array and exposure method using the same | Shun-Yong Zinn, Yong Hoon Kim | 2006-06-13 |
| 6783905 | Electron beam exposure method using variable backward scattering coefficient and computer-readable recording medium having thereof | — | 2004-08-31 |
| 6775815 | Exposure method for correcting line width variation in a photomask | Won-tai Ki, Ji-Hyeon Choi | 2004-08-10 |
| 6641979 | Technique of exposing a resist using electron beams having different accelerating voltages | — | 2003-11-04 |
| 6627366 | Electron beam exposure method having good linearity with respect to producing fine patterns | — | 2003-09-30 |
| 6555275 | Technique of exposing a resist using electron beams having different accelerating voltages, and method of manufacturing a photomask using the technique | — | 2003-04-29 |