JC

Ji-Hyeon Choi

Samsung: 8 patents #15,984 of 75,807Top 25%
SC Sk Geo Centric Co.: 2 patents #28 of 116Top 25%
SC Sk Innovation Co.: 2 patents #367 of 957Top 40%
AC Ajou University Industry-Academic Cooperation: 1 patents #220 of 591Top 40%
HM Hyundai Motor: 1 patents #6,384 of 11,886Top 55%
Overall (All Time): #402,147 of 4,157,543Top 10%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
12152171 Composition comprising recycled resin and ethylene-acrylic acid copolymer and preparation method thereof Bu Yeon Hwang, Sang Ha Son, Dong Hyun Woo 2024-11-26
12108677 Thermoelectric composite, preparation method therefor, and thermoelectric device and semiconductor device each comprising thermoelectric composite Tae Joo Park, Sang Woon Lee, Dae Woong Kim, Tae Jun Seok, Jae Hyun Yoon 2024-10-01
11932993 Composition for coating a paper, method for production thereof and coated paper Dong Hyun Woo, Sang Ha Son, Bu Yeon Hwang 2024-03-19
10237876 Method and device for controlling access of terminal for efficient use of resources in mobile communication system Nam-Ryul Jeon, Ki-Back Kim, Han-Seok Kim, Hyun-Ho Im 2019-03-19
9831543 Adaptable antenna apparatus for base station Han-Seok Kim, Kyu-II Yeon, Byung-tae Yoon, Jun-Sung Lee, Nam-Ryul Jeon 2017-11-28
9565617 Method and apparatus for configuring routing path in wireless communication system Kyu-II Yeon, Han-Seok Kim, Jun-Sung Lee 2017-02-07
9148340 Apparatus and method for network controlling in wireless communication system Sun-Wook Kim, Seong-Yong Park, Jun-Sung Lee 2015-09-29
8986087 Structure for protecting radio frequency remote head Seong-Yong Park, Han-Seok Kim, Jun-Sung Lee 2015-03-24
7185312 Exposure method for correcting line width variation in a photomask Won-tai Ki, Seung-hune Yang 2007-02-27
6786212 Method for preventing a reverse rotation of an engine 2004-09-07
6775815 Exposure method for correcting line width variation in a photomask Won-tai Ki, Seung-hune Yang 2004-08-10
6291119 Method of compensating for pattern dimension variation caused by re-scattered electron beam in electron beam lithography and recording medium in which the method is recorded Won-tai Ki 2001-09-18