HK

Hyun-Woo Kim

Samsung: 122 patents #289 of 75,807Top 1%
KAIST: 28 patents #360 of 11,619Top 4%
LG: 8 patents #5,418 of 26,165Top 25%
IC Iljin Co.: 7 patents #2 of 60Top 4%
HM Hyundai Motor: 6 patents #1,869 of 11,886Top 20%
HE Hynix (Hyundai Electronics): 4 patents #180 of 1,604Top 15%
HA Hyundai Autoever: 3 patents #5 of 116Top 5%
SC Shin-Etsu Chemical Co.: 3 patents #839 of 2,176Top 40%
KM Kia Motors: 3 patents #1,762 of 7,429Top 25%
KI Korea Electronics Technology Institute: 3 patents #157 of 614Top 30%
SC S-Printing Solution Co.: 2 patents #77 of 396Top 20%
HC Honor Device Co.: 2 patents #169 of 806Top 25%
VA Volvo Construction Equipment Ab: 1 patents #171 of 403Top 45%
IBM: 1 patents #44,794 of 70,183Top 65%
LS Lg Energy Solution: 1 patents #1,129 of 1,886Top 60%
GT Gwangju Institute Of Science And Technology: 1 patents #260 of 901Top 30%
HP HP: 1 patents #8,774 of 16,619Top 55%
KI Kia: 1 patents #2,072 of 4,539Top 50%
KI Korea Atomic Energy Research Institute: 1 patents #426 of 972Top 45%
AS Az Electronic Materials (Luxembourg) S.A.R.L.: 1 patents #75 of 145Top 55%
NE Nec: 1 patents #7,889 of 14,502Top 55%
PC Posco Co.: 1 patents #573 of 1,176Top 50%
SC Semes Co.: 1 patents #467 of 991Top 50%
SH Sk Hynix: 1 patents #3,115 of 4,849Top 65%
SF Snu R&Db Foundation: 1 patents #423 of 1,470Top 30%
SC Stemco Co.: 1 patents #30 of 74Top 45%
📍 Daejeon, CA: #11 of 225 inventorsTop 5%
Overall (All Time): #3,411 of 4,157,543Top 1%
198
Patents All Time

Issued Patents All Time

Showing 176–198 of 198 patents

Patent #TitleCo-InventorsDate
7203346 Face recognition method and apparatus using component-based face descriptor Tae-Kyun Kim, Won Jun Hwang, Seok-cheol Kee 2007-04-10
7164781 Method and apparatus of recognizing face using 2nd-order independent component analysis (ICA)/principal component analysis (PCA) Tae-Kyun Kim, Seok-cheol Kee, Jong Ha Lee, Won Jun Hwang, Chang Kyu Choi 2007-01-16
7045267 Resist composition comprising photosensitive polymer having lactone in its backbone Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Sook Lee, Sang-Gyun Woo +1 more 2006-05-16
6964839 Photosensitive polymer having cyclic backbone and resist composition containing the same Sang-jun Choi, Sang-Gyun Woo, Joo-tae Moon 2005-11-15
6962768 Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same Sang-Gyun Woo 2005-11-08
6897005 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same Sang-jun Choi 2005-05-24
6787287 Photosensitive polymers and resist compositions comprising the photosensitive polymers Sang-Gyun Woo, Yool Kang 2004-09-07
6713228 Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same Sang-Gyun Woo, Sung Ho Lee 2004-03-30
6677100 Photosensitive polymer containing Si, Ge or Sn and resist composition comprising the same Sang-Gyun Woo 2004-01-13
6673513 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same Sang-jun Choi 2004-01-06
6642336 Photosensitive polymer Sook Lee, Ki Young Kwon, Si-hyeung Lee, Kwang-Sub Yoon, Dong-won Jung +2 more 2003-11-04
6627382 Fluoro-containing photosensitive polymer and photoresist composition containing the same 2003-09-30
6596459 Photosensitive polymer and resist composition containing the same Ki Young Kwon, Si-hyeung Lee, Dong-won Jung, Sook Lee, Kwang-Sub Yoon +2 more 2003-07-22
6559228 Vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer Jin Baek Kim 2003-05-06
6537727 Resist composition comprising photosensitive polymer having loctone in its backbone Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Sook Lee, Sang-Gyun Woo +1 more 2003-03-25
6517990 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same Sang-jun Choi 2003-02-11
6503687 Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition Si-hyueng Lee, Ki Young Kwon, Dong-won Jung, Sang-jun Choi, Sang-Gyun Woo 2003-01-07
6497987 Photosensitive lithocholate derivative and chemically amplified photoresist composition containing the same Sook Lee, Sang-Gyun Woo 2002-12-24
6235836 Vinyl 4-t-butoxycarbonyloxbenzal-vinyl alcohol-vinylacetate copolymer and preparation method thereof Jin Baek Kim 2001-05-22
6117586 Cap assembly of battery Chang-Seob Kim, Ki Woong Jang, E-ju Hwang, Eui Sun Hong, Yoshiaki Miura 2000-09-12
6103448 Organometal-containing acrylate or methacrylate derivatives and photoresists containing the polymers thereof Jin Baek Kim 2000-08-15
5929176 Vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer, vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer and preparation methods thereof Jin Baek Kim, Jin-Seuk Kim 1999-07-27
5792823 Vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer, vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer and preparation methods thereof Jin Baek Kim, Jin-Seuk Kim 1998-08-11