Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11024631 | Integrated circuit device including field isolation layer and method of manufacturing the same | Won-Cheol Jeong | 2021-06-01 |
| 9236313 | Method of fabricating semiconductor device having dual gate | Hoon-Joo Na, Yu-Gyun Shin, Hong-Bae Park, Sug-hun Hong, Sang-Jin Hyun +1 more | 2016-01-12 |
| 8932922 | Method of fabricating semiconductor device having dual gate | Hoon-Joo Na, Yu-Gyun Shin, Hong-Bae Park, Sug-hun Hong, Sang-Jin Hyun +1 more | 2015-01-13 |
| 8748239 | Method of fabricating a gate | Jong Pil Kim, Young-Goan Jang, Dong Won Kim | 2014-06-10 |
| 8557651 | Method of manufacturing a semiconductor device using an etchant | Hyo-San Lee, Bo-Un Yoon, Kun-Tack Lee, Sang-Jin Hyun, Hoon-Joo Na +1 more | 2013-10-15 |
| 8524554 | Semiconductor device and method for fabricating the same | Anabela Veloso, Hongyu Yu, Stefan Kubicek, Shou-Zen Chang | 2013-09-03 |
| 8501550 | Method of fabricating gate and method of manufacturing semiconductor device using the same | Jong Pil Kim, Young-Goan Jang, Dong Won Kim | 2013-08-06 |
| 8367502 | Method of manufacturing dual gate semiconductor device | Hong-Bae Park, Sug-hun Hong, Sang-Jin Hyun, Hoon-joo Nah, Hyung-seok Hong | 2013-02-05 |
| 8313993 | Semiconductor device and method for fabricating the same | Anabela Veloso, Hongyu Yu, Stefan Kubicek, Shou-Zen Chang | 2012-11-20 |
| 8293599 | Methods of forming semiconductor devices having gates with different work functions using selective injection of diffusion inhibiting materials | Hoon-Joo Na, Yu-Gyun Shin, Hong-Bae Park, Sug-hun Hong, Sang-Jin Hyun +1 more | 2012-10-23 |
| 8119511 | Non-volatile memory device with improved immunity to erase saturation and method for manufacturing same | Bogdan Govoreanu, Hongyu Yu | 2012-02-21 |
| 7972950 | Method of fabricating semiconductor device having dual gate | Hoon-Joo Na, Yu-Gyun Shin, Hong-Bae Park, Sug-hun Hong, Sang-Jin Hyun +1 more | 2011-07-05 |
| 7892958 | Methods of fabricating semiconductor devices having transistors with different gate structures | Hye-Lan Lee, Yu-Gyun Shin, Sang-Bom Kang, Seong-Geon Park, Taek-Soo Jeon | 2011-02-22 |
| 7727841 | Method of manufacturing semiconductor device with dual gates | Hye-Lan Lee, Taek-Soo Jeon, Yu-Gyun Shin, Sang-Bom Kang | 2010-06-01 |
| 7531881 | Semiconductor devices having transistors with different gate structures and methods of fabricating the same | Hye-Lan Lee, Yu-Gyun Shin, Sang-Bom Kang, Seong-Geon Park, Taek-Soo Jeon | 2009-05-12 |
| 7507652 | Methods of forming a composite dielectric structure and methods of manufacturing a semiconductor device including a composite dielectric structure | Yu-Gyun Shin | 2009-03-24 |
| 7494859 | Semiconductor device having metal gate patterns and related method of manufacture | Taek-Soo Jeon, Hye-Lan Lee, Sang-Bom Kang, Yu-Gyun Shin | 2009-02-24 |
| 7399670 | Methods of forming different gate structures in NMOS and PMOS regions and gate structures so formed | Taek-Soo Jeon, Yu-Gyun Shin, Sang-Bom Kang, Hong-Bae Park, Hye-Lan Lee +2 more | 2008-07-15 |
| 7390719 | Method of manufacturing a semiconductor device having a dual gate structure | Taek-Soo Jeon, Yu-Gyun Shin, Sang-Bom Kang, Hye-Lan Lee, Sang-Yong Kim | 2008-06-24 |
| 7023037 | Integrated circuit devices having dielectric regions protected with multi-layer insulation structures | Hyeong-Geun An | 2006-04-04 |
| 6821862 | METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES THAT INCLUDE A METAL OXIDE LAYER DISPOSED ON ANOTHER LAYER TO PROTECT THE OTHER LAYER FROM DIFFUSION OF IMPURITIES AND INTEGRATED CIRCUIT DEVICES MANUFACTURED USING SAME | — | 2004-11-23 |
| 6740531 | Method of fabricating integrated circuit devices having dielectric regions protected with multi-layer insulation structures | Hyeong-Geun An | 2004-05-25 |
| 6509601 | Semiconductor memory device having capacitor protection layer and method for manufacturing the same | Yong-Tak Lee, Yeong-kwan Kim | 2003-01-21 |
| 6096592 | Methods of forming integrated circuit capacitors having plasma treated regions therein | — | 2000-08-01 |
| 6001660 | Methods of forming integrated circuit capacitors using metal reflow techniques | Young-soh Park, Sang In Lee, Cheol Seong Hwang, Doo-sup Hwang | 1999-12-14 |