Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11397380 | Critical dimension measurement system and method of measuring critical dimensions using same | Won Joo Park, Hyung Joo Lee, Seuk Hwan Choi, Yoon Taek Han | 2022-07-26 |
| 10831095 | Critical dimension measurement system and method of measuring critical dimensions using same | Won Joo Park, Hyung Joo Lee, Seuk Hwan Choi, Yoon Taek Han | 2020-11-10 |
| 8968970 | Phase shift masks and methods of forming phase shift masks | Se-Gun Moon, Hoon Kim | 2015-03-03 |
| 8865375 | Halftone phase shift blank photomasks and halftone phase shift photomasks | Il-Yong Jang, Hoon Kim, Hye-Kyoung Lee, Sang-Gyun Woo | 2014-10-21 |
| 8568944 | Reflective extreme ultraviolet mask and method of manufacturing the same | Hoon Kim, Young-Su Sung, Young-Kuen Kim | 2013-10-29 |
| 8524426 | Method of manufacturing a photomask | Jin Ho Choi | 2013-09-03 |
| 8435705 | Methods of correcting optical parameters in photomasks | Haek-seung Han, Sang-Gyun Woo | 2013-05-07 |
| 8361679 | Phase shift masks | Se-Gun Moon, Hoon Kim | 2013-01-29 |
| 8329363 | Methods of fabricating halftone phase shift blank photomasks and halftone phase shift photomasks | Il-Yong Jang, Hoon Kim, Hye-Kyoung Lee, Sang-Gyun Woo | 2012-12-11 |
| 8187778 | Method for correcting a position error of lithography apparatus | Jin Ho Choi | 2012-05-29 |
| 7956983 | Exposure equipment having auxiliary photo mask and exposure method using the same | — | 2011-06-07 |
| 7139064 | Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same | Chan-Soo Hwang, Young-Seog Kang | 2006-11-21 |
| 6835970 | Semiconductor device having self-aligned contact pads and method for manufacturing the same | Ji Soo Kim, Yun-sook Chae | 2004-12-28 |
| 6723607 | Method of forming fine patterns of semiconductor device | Ji Soo Kim | 2004-04-20 |