Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9978869 | P-channel transistor having an increased channel mobility due to a compressive stress-inducing gate electrode | Akihiro Shimizu, Nagatoshi Ooki, Yusuke Nonaka | 2018-05-22 |
| 9412669 | Semiconductor device and a method of manufacturing the same | Akihiro Shimizu, Nagatoshi Ooki, Yusuke Nonaka | 2016-08-09 |
| 8995748 | Defect image processing apparatus, defect image processing method, semiconductor defect classifying apparatus, and semiconductor defect classifying method | Tsunehiro Sakai, Shigeki Kurihara, Yutaka Tandai, Tamao Ishikawa, Yuichi Hamamura +2 more | 2015-03-31 |
| 8963250 | Semiconductor device including a film for applying stress to a channel formation region to increase current flow | Akihiro Shimizu, Nagatoshi Ooki, Yusuke Nonaka | 2015-02-24 |
| 8595666 | Semiconductor defect classifying method, semiconductor defect classifying apparatus, and semiconductor defect classifying program | Koichi Hayakawa, Takehiro Hirai, Yutaka Tandai, Tamao Ishikawa, Tsunehiro Sakai +3 more | 2013-11-26 |
| 7705402 | Semiconductor device including a nitride containing film to generate stress for improving current driving capacity of a field effect transistor | Akihiro Shimizu, Nagatoshi Ooki, Yusuke Nonaka | 2010-04-27 |
| 7414293 | Structure and method of applying localized stresses to the channels of PFET and NFET transistors for improved performance | Akihiro Shimizu, Nagatoshi Ooki, Yusuke Nonaka | 2008-08-19 |
| 7411253 | CMOS transistors using gate electrodes to increase channel mobilities by inducing localized channel stress | Akihiro Shimizu, Nagatoshi Ooki, Yusuke Nonaka | 2008-08-12 |
| 7163886 | Semiconductor integrated circuit device and process for manufacturing the same | Tsuyoshi Fujiwara, Masahiro Ushiyama, Naohumi Ohashi, Tetsuo Saito | 2007-01-16 |
| 7115954 | Semiconductor device including stress inducing films formed over n-channel and p-channel field effect transistors and a method of manufacturing the same | Akihiro Shimizu, Nagatoshi Ooki, Yusuke Nonaka | 2006-10-03 |
| 6982465 | Semiconductor device with CMOS-field-effect transistors having improved drain current characteristics | Yukihiro Kumagai, Hiroyuki Ohta, Fumio Ootsuka, Shuji Ikeda, Takahiro Onai +2 more | 2006-01-03 |
| 6933564 | Semiconductor integrated circuit device and method of manufacturing the same | Youhei Yanagida, Tomohiro Saito, Shinichiro Mitani | 2005-08-23 |
| 6905982 | Method of manufacturing a semiconductor integrated circuit device | Hidenori Sato, Yukino Ishii, Tomoko Jinbo | 2005-06-14 |
| 6847093 | Semiconductor integrated circuit device | Fumio Ootsuka | 2005-01-25 |
| 6806128 | Semiconductor integrated circuit device and a method of manufacturing the same | Fumio Ootsuka, Shoji Wakahara | 2004-10-19 |
| 6706582 | Semiconductor integrated circuit device and method of manufacturing the same | Youhei Yanagida, Tomohiro Saito, Shinichiro Mitani | 2004-03-16 |
| 6613634 | Method of manufacturing a semiconductor device using oblique ion injection | Fumio Ootsuka | 2003-09-02 |