| 12309464 |
Graphics engine and graphics processing method applicable to player |
Chaoran Li, Hao Wang, Zhaozheng WANG |
2025-05-20 |
| 9385252 |
Method for insulating aluminum backboard of photovoltaic |
Yuanzhun Gao, Songhua Xue, Xianghua Yang, Jialin Gong, Chao Yang +3 more |
2016-07-05 |
| 8283733 |
Semiconductor devices with gate electrodes and with monocrystalline silicon regions that contain atoms of nitrogen and one or more of chlorine, bromine, sulfur, fluorine, or phosphorus |
Ching-Hwa Chen |
2012-10-09 |
| 7910429 |
Method of forming ONO-type sidewall with reduced bird's beak |
Chuck Jang, Ching-Hwa Chen, Chunchieh Huang, Jin Ho Kim, Vei-Han Chan +4 more |
2011-03-22 |
| 7851339 |
Method of repairing deep subsurface defects in a silicon substrate that includes diffusing negatively charged ions into the substrate from a sacrificial oxide layer |
Ching-Hwa Chen |
2010-12-14 |
| 7807577 |
Fabrication of integrated circuits with isolation trenches |
Ching-Hwa Chen |
2010-10-05 |
| 7737487 |
Nonvolatile memories with tunnel dielectric with chlorine |
Barbara Haselden |
2010-06-15 |
| 7387972 |
Reducing nitrogen concentration with in-situ steam generation |
Chiliang Chen, Ching-Hwa Chen |
2008-06-17 |
| 7323729 |
Methods for improving quality of high temperature oxide (HTO) formed from halogen-containing precursor and products thereof and apparatus therefor |
Chuck Jang, Chia-Shun Hsiao |
2008-01-29 |
| 7297597 |
Method for simultaneously fabricating ONO-type memory cell, and gate dielectrics for associated high voltage write transistors and gate dielectrics for low voltage logic transistors by using ISSG |
Chuck Jang, Ching-Hwa Chen, Chia-Shun Hsiao |
2007-11-20 |
| 7265015 |
Use of chlorine to fabricate trench dielectric in integrated circuits |
Tai-Peng Lee |
2007-09-04 |
| 7229880 |
Precision creation of inter-gates insulator |
Chuck Jang, Chunchieh Huang |
2007-06-12 |
| 7122415 |
Atomic layer deposition of interpoly oxides in a non-volatile memory device |
Chuck Jang, Vei-Han Chan, Ching-Hwa Chen |
2006-10-17 |
| 7071127 |
Methods for improving quality of semiconductor oxide composition formed from halogen-containing precursor |
Chuck Jang, Chia-Shun Hsiao |
2006-07-04 |
| 7001810 |
Floating gate nitridation |
Chuck Jang, Ching-Hwa Chen |
2006-02-21 |
| 6893920 |
Method for forming a protective buffer layer for high temperature oxide processing |
Chuck Jang |
2005-05-17 |
| 6849897 |
Transistor including SiON buffer layer |
Chuck Jang |
2005-02-01 |
| 6534388 |
Method to reduce variation in LDD series resistance |
Wenhe Lin, Simon Chooi, Kin Leong Pey |
2003-03-18 |
| 6524910 |
Method of forming dual thickness gate dielectric structures via use of silicon nitride layers |
Wenhe Lin, Kin Leong Pey, Mei Sheng Zhou, Simon Chooi |
2003-02-25 |
| 6261976 |
Method of forming low pressure silicon oxynitride dielectrics having high reliability |
— |
2001-07-17 |
| 6187633 |
Method of manufacturing a gate structure for a semiconductor memory device with improved breakdown voltage and leakage rate |
Joe Hui, Anqing Zhang |
2001-02-13 |