Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7910429 | Method of forming ONO-type sidewall with reduced bird's beak | Zhong Dong, Ching-Hwa Chen, Chunchieh Huang, Jin Ho Kim, Vei-Han Chan +4 more | 2011-03-22 |
| 7323729 | Methods for improving quality of high temperature oxide (HTO) formed from halogen-containing precursor and products thereof and apparatus therefor | Zhong Dong, Chia-Shun Hsiao | 2008-01-29 |
| 7297597 | Method for simultaneously fabricating ONO-type memory cell, and gate dielectrics for associated high voltage write transistors and gate dielectrics for low voltage logic transistors by using ISSG | Zhong Dong, Ching-Hwa Chen, Chia-Shun Hsiao | 2007-11-20 |
| 7229880 | Precision creation of inter-gates insulator | Zhong Dong, Chunchieh Huang | 2007-06-12 |
| 7122415 | Atomic layer deposition of interpoly oxides in a non-volatile memory device | Zhong Dong, Vei-Han Chan, Ching-Hwa Chen | 2006-10-17 |
| 7087998 | Control of air gap position in a dielectric layer | Tai-Peng Lee, Ching-Yueh Hu | 2006-08-08 |
| 7071127 | Methods for improving quality of semiconductor oxide composition formed from halogen-containing precursor | Zhong Dong, Chia-Shun Hsiao | 2006-07-04 |
| 7026172 | Reduced thickness variation in a material layer deposited in narrow and wide integrated circuit trenches | Tai-Peng Lee | 2006-04-11 |
| 7001810 | Floating gate nitridation | Zhong Dong, Ching-Hwa Chen | 2006-02-21 |
| 6924542 | Trench isolation without grooving | Hua Ji, Dong-Jun KIM, Jin Ho Kim | 2005-08-02 |
| 6893920 | Method for forming a protective buffer layer for high temperature oxide processing | Zhong Dong | 2005-05-17 |
| 6881668 | Control of air gap position in a dielectric layer | Tai-Peng Lee, Ching-Yueh Hu | 2005-04-19 |
| 6849897 | Transistor including SiON buffer layer | Zhong Dong | 2005-02-01 |
| 6787409 | Method of forming trench isolation without grooving | Hua Ji, Dong-Jun KIM, Jin Ho Kim | 2004-09-07 |
| 5767004 | Method for forming a low impurity diffusion polysilicon layer | Narayanan Balasubramanian, Ching Win Kong | 1998-06-16 |
| 5618756 | Selective WSix deposition | Peter Chew | 1997-04-08 |