{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning", "item": "https://www.patentleaderboard.com/patent/9881793"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning

Neutral hard mask and its application to graphoepitaxy-based directed self-assembly (DSA) patterning

US Patent 9881793 · Granted Jan 30, 2018

Estimated economic value: $2,622,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Applying inert ion beam etching for improving a profile and repairing sidewall d2025
Neural network accelerators resilient to conductance drift2025
Fabrication of all-solid-state energy storage devices2024
Methods for etching metal films using plasma processing2024
Row-by-row convolutional neural network mapping for analog artificial intelligen2024
Efficient tile mapping for row-by-row convolutional neural network mapping for a2024
Microfabricated air bridges for quantum circuits2023
Efficient tile mapping for row-by-row convolutional neural network mapping for a2023
Drift regularization to counteract variation in drift coefficients for analog ac2022
Mitigation of conductance drift in neural network resistive processing units2022
III-V lateral bipolar junction transistor on local facetted buried oxide layer2022
III-V lateral bipolar junction transistor on local facetted buried oxide layer2022