Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of fabricating semiconductor structures on dissimilar substrates

Method of fabricating semiconductor structures on dissimilar substrates

US Patent 9698222 · Granted Jul 4, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Nanowire transistor fabrication with hardmask layers2025
Staggered vertically spaced integrated circuit line metallization with different2025
Capacitor with dual dielectric layers2025
Dielectric sidewall features for tuning thin film transistor (TFT) parasitics2025
Subtractively patterned interconnect structures for integrated circuits2025
Punch-through interconnect feature to couple upper electrodes of capacitors of m2025
Gate-to-gate isolation for stacked transistor architecture via non-selective die2025
Plug and recess process for dual metal gate on stacked nanoribbon devices2025
Capacitor with an electrically conductive layer coupled with a metal layer of th2025
Compositional engineering of Schottky diode2025
Compositional engineering of Schottky diode2025
Co-integrated gallium nitride (GaN) and complementary metal oxide semiconductor 2025