Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method

US Patent 9606434 · Granted Mar 28, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Integrated circuit chips for a phased array system including programmable on-chi2025
Aromatic underlayer2025
Aromatic underlayer2025
Aromatic underlayer2025
Adhesion promoting photoresist underlayer composition2025
Photoresists comprising multiple acid generator compounds2025
Photoresists comprising multiple acid generator compounds2025
Photoresists comprising multiple acid generator compounds2025
Extensive-dimensional solutions for data lineage2025
Phased array control circuit for controlling directivity of a beam-formed signal2025
Underlayer compositions and patterning methods2025
Underlayer compositions and patterning methods2025