Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films

Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films

US Patent 9524874 · Granted Dec 20, 2016

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

On demand serverless container based storage transfer2025
Microparticle compositions comprising saflufenacil2022
Metal-doped tin oxide for electrocatalysis applications2021
Aqueous formulations with good storage capabilities2021
Alkaline detergent composition containing a carboxylic acid terpolymer for hard 2020
Chemical mechanical polishing (CMP) composition comprising a polymeric polyamine2019
Solidification matrix comprising a carboxylic acid terpolymer2019
Chemical mechanical polishing (CMP) composition for high effective polishing of 2019
Chemical-mechanical polishing composition comprising organic/inorganic composite2019
Use of alkoxylated non-ionic surfactants as additive in aqueous membrane cleanin2018
Alkaline detergent composition containing a carboxylic acid/polyalkylene oxide c2017
Chemical mechanical polishing (CMP) composition comprising a protein2017