Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for single fin cuts using selective ion implants

Method for single fin cuts using selective ion implants

US Patent 9287130 · Granted Mar 15, 2016

Estimated economic value: $907,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vertical field effect transistor with minimal contact to gate erosion2025
Semiconductor device having hybrid middle of line contacts2025
Electro-optical high bandwidth ultrafast differential RAM2025
Stacked field effect transistor structure with independent gate control between 2025
Bottom contact with self-aligned spacer for stacked semiconductor devices2025
Template for growing a crystal of a two-dimensional material2025
TSV and backside power distribution structure2025
Method for low-cost, high-bandwidth monolithic system integration beyond reticle2025
Vertically stacked FET with strained channel2025
Wraparound contact with reduced distance to channel2025
Nanowire source/drain formation for nanosheet device2025
Nanowire source/drain formation for nanosheet device2025