Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus

US Patent 9207541 · Granted Dec 8, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Projection exposure apparatus for semiconductor lithography2025
Facet assembly for a facet mirror2025
Support for an optical element2025
Optical arrangement and method for repairing the optical arrangement after a sho2022
Method and device for determining the heating state of an optical element in an 2022
Method and device for determining the heating state of an optical element in an 2022
Support of an optical unit2022
Method for determining properties of an EUV source2021
Optical arrangement for EUV radiation with a shield for protection against the e2021
Optical module with an anticollision device for module components2021
Optical correction arrangement, projection objective having such an optical corr2020
Device for swiveling a mirror element with two degrees of swiveling freedom2020