Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and device for determining the heating state of an optical element in an optical system for microlithography

Method and device for determining the heating state of an optical element in an optical system for microlithography

US Patent 11320314 · Granted May 3, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Projection exposure apparatus for semiconductor lithography2025
Projection exposure apparatus for semiconductor lithography2025
Projection objective including an optical device2025
Facet assembly for a facet mirror2025
Facet assembly for a facet mirror2025
Support for an optical element2025
Support for an optical element2025
Stop, optical system and lithography apparatus2025
Mirror, in particular for a microlithographic projection exposure apparatus2025
Method and device for characterizing the surface shape of an optical element2024
Projection exposure method and projection lens with setting of the pupil transmi2024
Mirror, in particular for a microlithographic projection exposure apparatus2023