Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate

Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrate

US Patent 8993201 · Granted Mar 31, 2015

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reflective mask blank for EUV lithography2021
Method for manufacturing multilayer film-deposited substrate and multilayer film2020
Reflective mask blank for EUV lithography, and process for its inspection and pr2017
Reflective mask blank for EUV lithography and process for its production, as wel2017
Reflective mask blank for EUV lithography, or reflective layer-coated substrate 2016
Reflective mask blank for EUV lithography and process for its production2016
Reflective mask blank for EUV lithography, method of manufacturing thereof, refl2016
Reflective mask blank for EUV lithography, and process for its production2015
SPARC-derived tumor rejection antigenic peptides and medicaments comprising the 2015
Reflective mask blank for EUV lithography and process for its production, as wel2015
Optical member for EUV lithography2015
Optical member for EUV lithography, and process for production of reflective lay2015