Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for manufacturing multilayer film-deposited substrate and multilayer film-deposited substrate

Method for manufacturing multilayer film-deposited substrate and multilayer film-deposited substrate

US Patent 10775692 · Granted Sep 15, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reflective mask blank for EUV lithography and process for its production, as wel2017
Reflective mask blank for EUV lithography, or reflective layer-coated substrate 2016
Reflective mask blank for EUV lithography and process for its production2016
Reflective mask blank for EUV lithography, and process for its production2015
Reflective mask blank for EUV lithography and process for its production, as wel2015
Reflective layer-equipped substrate for EUV lithography, reflective mask blank f2015
Optical member for EUV lithography2015
Optical member for EUV lithography, and process for production of reflective lay2015
Substrate with reflective layer for EUV lithography and reflective mask blank fo2014
Transparent body inspecting device2014
Multilayer mirror for EUV lithography and process for its production2013
Reflective mask blank for EUV lithography2012