Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reflective mask blank for EUV lithography, and process for its inspection and process for its production

Reflective mask blank for EUV lithography, and process for its inspection and process for its production

US Patent 9739722 · Granted Aug 22, 2017

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Core-shell catalyst for oxygen reduction reaction, and method of designing catal2024
Cathode electrode catalyst of fuel cell, and reaction acceleration method2022
Methacrylic resin, method for producing methacrylic resin, shaped article and au2021
Reflective mask blank for EUV lithography2021
Reflective mask blank and process for producing the reflective mask blank2018
Glass substrate for mask blank2018
Operation process creation program, operation process creation method, and infor2017
Reflective mask blank for EUV lithography, substrate with funtion film for the m2017
Reflective mask blank for EUV lithography, method of manufacturing thereof, refl2016
SPARC-derived tumor rejection antigenic peptides and medicaments comprising the 2015
Reflective layer-equipped substrate for EUV lithography, reflective mask blank f2015
Multilayer substrate, manufacturing method for multilayer substrate, and quality2014