Light pattern exposure method, photomask, and photomask blank

Assignee

• Shin-Etsu Chemical Co.
• Toppan Printing Co.

Inventors

• Hiroki Yoshikawa (113 patents)
• Yukio Inazuki (100 patents)
• Ryuji Koitabashi (15 patents)
• Hideo Kaneko (82 patents)
• Yosuke Kojima (13 patents)
• Takashi Haraguchi (32 patents)
• Tomohito Hirose (3 patents)

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