Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank

Substrate with multilayer reflection film for EUV mask blank, manufacturing method thereof, and EUV mask blank

US Patent 11860529 · Granted Jan 2, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Load detection mechanism and pin-type load cell2025
Reflective mask blank and method for manufacturing reflective mask2025
Solid state imaging element, imaging apparatus, and method for controlling solid2025
Reflective mask blank, and reflective mask2025
Reflective mask blank, and method for manufacturing reflective mask2025
Reflective mask blank, and method for manufacturing reflective mask2025
Reflective mask blank, and method for manufacturing reflective mask2025
Imaging device and electronic apparatus2025
Phase shift mask blank, manufacturing method of phase shift mask, and phase shif2025
Reflective mask blank and reflective mask2024
Reflective mask blank and reflective mask2024
Cooling device2024