Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Silicon nitride passivation layer for covering high aspect ratio features

Silicon nitride passivation layer for covering high aspect ratio features

US Patent 8563095 · Granted Oct 22, 2013

Estimated economic value: $10,239,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods of forming 3D NAND structures with decreased pitch2025
Methods and mechanisms for adjusting film deposition parameters during substrate2025
Monolithic complementary field-effect transistors having carbon-doped release la2025
Ultra-high modulus and etch selectivity boron-carbon hardmask films2025
Modified stacks for 3D NAND2025
Modified stacks for 3D NAND2025
Faceplate having a curved surface2024
Visual localization method, terminal, and server2024
Method of dielectric material fill and treatment2024
Methods and apparatus for forming backside power rails2024
Doped selective metal caps to improve copper electromigration with ruthenium lin2024
Method of forming nickel silicide materials2024