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Home › Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum

Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum

US Patent 8557094 · Granted Oct 15, 2013

Estimated economic value: $14,573,000 ⓘ

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