Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of pattern etching a dielectric film while removing a mask layer

Method of pattern etching a dielectric film while removing a mask layer

US Patent 8252192 · Granted Aug 28, 2012

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method of making a three-dimensional memory device using composite hard masks fo2024
Pattern enhancement using a gas cluster ion beam2023
Multilevel memory stack structure with tapered inter-tier joint region and metho2023
Three-dimensional memory device including discrete charge storage elements and m2022
Pattern enhancement using a gas cluster ion beam2022
Semiconductor device including having metal organic framework interlayer dielect2022
Three-dimensional memory device including discrete charge storage elements and m2022
Three-dimensional memory device containing metal-organic framework inter-word li2022
Semiconductor device containing metal-organic framework inter-line insulator str2022
Three-dimensional memory device including an inter-tier etch stop layer and meth2022
Three-dimensional memory device including molybdenum word lines and metal oxide 2022
Bonded assembly containing metal-organic framework bonding dielectric and method2021